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Database Needs for Modeling and Simulation of Plasma Processing (1996) / Chapter Skim
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Pages 34-34

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From page 34...
... Surface processes related to poly-Si etching have at least been studied by several investigators using CI2 and HBr gases.3 For SiO2 etching in high-density fluorocarbon plasmas many studies exist, but little surface chemistry work has been performed.4 The surface processes related to silicon dioxide PECVD have been studied by attenuated-total reflectance TR.s TECHNIQUES FOR IMPROVING TlIE DATABASE Approach A two-fold experimental approach appears most promising in improving the database in this field. First, detailed measurements on actual plasma processing systems need to be made.
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Key Terms

  • plasma processing
  • plasma process
  • thermochemical data
  • incident species
  • ion bombardment

  • plasma etching
  • silicon dioxide
  • reaction layer
  • surface reaction
  • surface science

  • surface chemistry
  • plasma reactor
  • science aspects
  • apparatus using
  • actual plasma

  • processes related
  • relevant energies
  • species incident
  • incident flux
  • surface processes


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