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Database Needs for Modeling and Simulation of Plasma Processing (1996) / Chapter Skim
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Pages 43-43

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From page 43...
... The negative ions formed may influence the free-electron density and may also participate in nucleation of parasitic dust. Although there have been few measurements, recent exceptions used Fourier transform mass spectrometry techniques and beam techniques to determine dissociative attachment cross sections for SiF4 and CF4 7 and SiH4.8 Some experimental effort has been devoted to the study of attachment to vibrationally excited molecuTes.9 There exist virtually no data on electron attachment to radicals, although such species are produced in large numbers in plasmas.
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Key Terms

  • cross sections
  • plasma processing
  • ionization cross
  • plasma process
  • dissociative attachment

  • dissociation cross
  • cross section
  • attachment cross
  • excitation cross
  • vibrational excitation

  • ion processes
  • negative ion
  • negative ions
  • momentum transfer
  • vibrationally excited

  • mass spectrometry
  • complex molecules
  • dissociation fragments
  • processing plasmas
  • beam techniques

  • ion formation


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