Database Needs for Modeling and Simulation of Plasma Processing (1996) / Chapter Skim
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Pages 5-7
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From page 5... ...
It is intended for a variety of audiences: academic and government laboratory researchers, industrial engineers and scientists, and program managers at federal funding agencies. The scope ofthe report is substantial, covering the industrial needs for better plasma process engineering, the current state of the art in plasma modeling, and the various supporting databases and diagnostic techniques that underlie and complement modeling and simulation.
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From page 6... ...
From the industrial perspective, plasma processing, especially plasma etching, is often seen as being unusually difficult to understand and control.5 Although some ofthe general mechanisms of the plasma are known such as the role of chemical interactions with radicals such as F or C] atoms, the role of sidewall passivation In preserving etch an~sotropy, and the fact that positive ion bombardment of surfaces has a mechanical sputtering role many details remain obscure.
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From page 7... ...
Partly in response to the challenges of etching high-aspect-ratio features, plasma equipment manufacturers have introduced in the last several years new plasma tools capable of operating at relatively low gas pressures, usually between several m~litorr and several tens of m~litorr. It is thought that the .
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